SCOPUS 정보 검색 플랫폼

Volumn 269, Issue , 2013, Pages 45-49

On the difference between optically and electrically determined resistivity of ultra-thin titanium nitride films

Author keywords

Current voltage characteristics; Resistivity; Spectroscopic ellipsometry; Titanium nitride

Indexed keywords

ATOMIC LAYER DEPOSITION; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC CONDUCTIVITY; ELECTRON SCATTERING; GRAIN BOUNDARIES; SPECTROSCOPIC ELLIPSOMETRY;

ATOMIC LAYER DEPOSITED; ELECTRICAL TESTS; RESISTIVITY VALUES; SPECTROSCOPIC ELLIPSOMETRY MEASUREMENTS; TITANIUM NITRIDE FILMS; ULTRA-THIN;

TITANIUM NITRIDE;

EID: 84875422526 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2012.09.074 Document Type: Conference Paper

Times cited : (52)

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