Enhanced sputtering of titanium oxide, nitride and oxynitride thin films by the reactive gas pulsing technique

Surface and Coatings Technology

Volumn 142-144, Issue , 2001, Pages 615-620

  Martin, N ^a,b   Sanjines R ^a   Takadoum, J ^b   Levy F ^a  

^a EPFL   (Switzerland)

^b Centre National de la Recherche Scientifique   (France)

Author keywords

Gas pulsing; Nitride; Oxynitride; Reactive sputtering; Titanium oxide

Indexed keywords

ARGON; DEPOSITION; MAGNETRON SPUTTERING; PULSATILE FLOW; THIN FILMS;

GAS INJECTION TIME;

TITANIUM OXIDES;

COATING;

EID: 0035387766     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(01)01149-5     Document Type: Article

References (19)