Effect of substrate temperature on the microstructural properties of titanium nitride nanowires grown by pulsed laser deposition

Journal of Applied Physics

Volumn 116, Issue 6, 2014, Pages

  Gbordzoe, S ^a   Kotoka, R ^a   Craven, Eric ^a,c   Kumar, D ^a   Wu, F ^b   Narayan, J ^b  

^a NORTH CAROLINA A AND T STATE UNIVERSITY   (United States)

^b North Carolina State University   (United States)

^c Kernodle Middle School   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CORROSION; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; FIELD EMISSION MICROSCOPES; METALLIC FILMS; PULSED LASER DEPOSITION; TITANIUM NITRIDE; TRANSMISSION ELECTRON MICROSCOPY;

CORROSIVE ENVIRONMENT; DOMAIN MATCHING EPITAXY; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; MICRO-STRUCTURAL CHARACTERIZATION; MICRO-STRUCTURAL PROPERTIES; SINGLE CRYSTAL SILICON; SUBSTRATE TEMPERATURE; TITANIUM NITRIDE NANOWIRES;

NANOWIRES;

EID: 84906317580     PISSN: 00218979     EISSN: 10897550     Source Type: Journal    
DOI: 10.1063/1.4893298     Document Type: Article

References (41)

1. C. M. Lieber, MRS Bull. 28, 486 (2003). 10.1557/mrs2003.144
2. M. K. Sunkara, S. Sharma, R. Miranda, G. Lian, and E. C. Dickey, Appl. Phys. Lett. 79, 1546 (2001). 10.1063/1.1401089
3. H. W. Kim and S. H. Shim, Chem. Phys. Lett. 422, 165 (2006). 10.1016/j.cplett.2006.02.062
4. M. Dresselhaus, Y.-M. Lin, O. Rabin, M. Black, J. Kong, and G. Dresselhaus, in Springer Handbook of Nanotechnology, edited by B. Bhushan (Springer, Berlin, Heidelberg, 2007), p. 113.
5. K. Chen, Z. Huang, J. Huang, M. Fang, Y.-G. Liu, H. Ji, and L. Yin, Ceram. Int. 39, 1957 (2013). 10.1016/j.ceramint.2012.08.046
6. B. Kalska-Szostko, U. Wykowska, K. Piekut, and E. Zambrzycka, Colloids Surf. A 416, 66 (2013). 10.1016/j.colsurfa.2012.10.019
7. L. Lin, W. Wang, J. Huang, Q. Li, D. Sun, X. Yang, H. Wang, N. He, and Y. Wang, Chem. Eng. J. 162, 852 (2010). 10.1016/j.cej.2010.06.023
8. S. P. Mondal, A. Dhar, and S. K. Ray, Mater. Sci. Semicond. Process. 10, 185 (2007). 10.1016/j.mssp.2007.11.003
9. X. Duan and C. M. Lieber, Adv. Mater. 12, 298 (2000). 10.1002/(SICI)1521-4095(200002)12:4<298::AID-ADMA298>3.0.CO;2-Y
10. M. S. Gudiksen, J. Wang, and C. M. Lieber, J. Phys. Chem. B 105, 4062 (2001). 10.1021/jp010540y
11. X. F. Duan, Y. Huang, R. Agarwal, and C. M. Lieber, Nature 421, 241 (2003). 10.1038/nature01353
12. Y. Y. Wu, H. Q. Yan, and P. D. Yang, Top. Catal. 19, 197 (2002). 10.1023/A:1015260008046
13. O. H. Elibol, D. Morisette, D. Akin, J. P. Denton, and R. Bashir, Appl. Phys. Lett. 83, 4613 (2003). 10.1063/1.1630853
14. R. Banerjee, R. Chandra, and P. Ayyub, Thin Solid Films 405, 64 (2002). 10.1016/S0040-6090(01)01705-9
15. P. LeClair, G. P. Berera, and J. S. Moodera, Thin Solid Films 376, 9 (2000). 10.1016/S0040-6090(00)01192-5
16. A. Tarniowy, R. Mania, and M. Rekas, Thin Solid Films 311, 93 (1997). 10.1016/S0040-6090(97)00714-1
17. A. P. Serro, C. Completo, R. Colaço, F. dos Santos, C. L. da Silva, J. M. S. Cabral, H. Araújo, E. Pires, and B. Saramago, Surf. Coat. Technol. 203, 3701 (2009). 10.1016/j.surfcoat.2009.06.010
18. H. Kashani, M. Heydarzadeh Sohi, and H. Kaypour, Mater. Sci. Eng. A 286, 324 (2000). 10.1016/S0921-5093(00)00744-9
19. N. C. Cady, N. Fahrenkopf, and A. Mosier, Proc. SPIE 7397, 739707 (2009). 10.1117/12.824537
20. M. K. Faruque, K. M-Darkwa, Z. G. Xu, and D. Kumar, Appl. Surf. Sci. 260, 36 (2012). 10.1016/j.apsusc.2012.01.056
21. Y. M. Hu, K. F. Huo, Y. W. Ma, Y. N. Lue, J. Q. Xu, Z. Hu, and Y. Chen, J. Nanosci. Nanotechnol. 7, 2922 (2007). 10.1166/jnn.2007.686
22. U. A. Joshi, S. H. Chung, and J. S. Lee, J. Solid State Chem. 178, 755 (2005). 10.1016/j.jssc.2004.12.032
23. J. Ding, C. Deng, W. Yuan, H. Zhu, and J. Li, Ceram. Int. 39, 2995 (2013). 10.1016/j.ceramint.2012.09.077
24. F. Wu, Y. T. Zhu, and J. Narayan, Philos. Mag. 93, 4355 (2013). 10.1080/14786435.2013.829251
25. F. Wu and J. Narayan, Cryst. Growth Des. 13, 5018 (2013). 10.1021/cg4011983
26. M. Bechelany, X. Maeder, J. Riesterer, J. Hankache, D. Lerose, S. Christiansen, J. Michler, and L. Philippe, Cryst. Growth Des. 10, 587 (2010). 10.1021/cg900981q
27. C. Samanta, D. S. Chander, J. Ramkumar, and S. Dhamodaran, Mater. Res. Bull. 47, 952 (2012). 10.1016/j.materresbull.2012.01.012
28. C. Li, D. Zhang, S. Han, X. Liu, T. Tang, and C. Zhou, Adv. Mater. 15, 143 (2003). 10.1002/adma.200390029
29. Y. Cui, L. J. Lauhon, M. S. Gudiksen, J. Wang, and C. M. Lieber, Appl. Phys. Lett. 78, 2214 (2001). 10.1063/1.1363692
30. F. Shi, Y. Shim, and J. G. Amar, Phys. Rev. E 79, 011602 (2009). 10.1103/PhysRevE.79.011602
31. P. A. Mulheran and J. A. Blackman, Phys. Rev. B 53, 10261 (1996). 10.1103/PhysRevB.53.10261
32. L. I. Maissel and R. Glang, Reinhard 1 (McGraw-Hill, New York, 1995).
33. S. A. Dayeh, E. T. Yu, and D. Wang, Nano Lett. 7, 2486 (2007). 10.1021/nl0712668
34. R. Sivakumar, T. Tsunoda, Y. Kuroki, T. Okamoto, and M. Takata, Mater. Chem. Phys. 134, 345 (2012). 10.1016/j.matchemphys.2012.02.075
35. F. Fang, D. X. Zhao, J. Y. Zhang, D. Z. Shen, Y. M. Lu, X. W. Fan, B. H. Li, and X. H. Wang, Mater. Lett. 62, 1092 (2008). 10.1016/j.matlet.2007.07.073
36. P. Buffat and J. P. Borel, Phys. Rev. A 13, 2287 (1976). 10.1103/PhysRevA.13.2287
37. J. Narayan and B. C. Larson, J. Appl. Phys. 93, 278 (2003). 10.1063/1.1528301
38. J. Narayan, Acta Mater. 61, 2703 (2013). 10.1016/j.actamat.2012.09.070
39. J. Narayan, U.S. patent 5,406,123 (April 11, 1995).
40. M. Razavi, M. Fathi, O. Savabi, B. H. Beni, S. M. Razavi, D. Vashaee, and L. Tayebi, Appl. Surf. Sci. 288, 130 (2014). 10.1016/j.apsusc.2013.09.160
41. P. Salunke, V. Shanov, and F. Witte, Mater. Sci. Eng. B 176, 1711 (2011). 10.1016/j.mseb.2011.07.002