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Chemical Vapor Deposition

Volumn 6, Issue 1, 2000, Pages 21-26

Neo-pentoxide precursors for MOCVD thin films of TiO2 and ZrO2

(5) Gallegos III, Jesus J a,b Ward, Timothy L b Boyle, Timothy J a Rodrigitez, Mark A a Francisco, Laila P b

a SANDIA NATIONAL LABORATORIES (United States)

b University of New Mexico (United States)

Author keywords

Anatase; Metal alkoxide; Neo pentoxide; Zirconium oxide

Indexed keywords

EID: 10444259815 PISSN: 09481907 EISSN: None Source Type: Journal
DOI: 10.1002/(sici)1521-3862(200002)6:1<21::aid-cvde21>3.0.co;2-c Document Type: Article

Times cited : (39)

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21
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- note
- 4Zr: Calcd. 54.62 %C; 10.08 %H. Found 54.14 %C; 10.13 %H.

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