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Chemical Vapor Deposition

Volumn 4, Issue 6, 1998, Pages 220-222

Anhydrous Metal Nitrates as Volatile Single Source Precursors for the CVD of Metal Oxide Films

(5) Colombo, Daniel G a Gilmer, David C a Young Jr , Victor G a Campbell, Stephen A b Gladfelter, Wayne L a

a University of Minnesota (United States)

b UNIVERSITY OF MINNESOTA (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001076153 PISSN: 09481907 EISSN: None Source Type: Journal
DOI: 10.1002/(SICI)1521-3862(199812)04:06<220::AID-CVDE220>3.0.CO;2-E Document Type: Article

Times cited : (102)

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