Composition and microstructure of zirconia films obtained by MOCVD with a new, liquid, mixed acetylacetonato-alcoholato precursor

Chemical Vapor Deposition

Volumn 5, Issue 4, 1999, Pages 151-158

  Morstein, Marcus ^a,b   Pozsgai, Imre ^a   Spencer, Nicholas D ^a  

^a ETH ZURICH   (Switzerland)

^b RESEARCH INSTITUTE FOR TECHNICAL PHYSICS AND MATERIALS SCIENCE   (Hungary)

Author keywords

Microstructure; MOCVD; Precursor; SEM; XPS; XRD; Zirconia

Indexed keywords

EID: 0000395209     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1521-3862(199908)5:4<151::AID-CVDE151>3.0.CO;2-9     Document Type: Article

References (58)

1. G. Garcia, A. Figueras, J. Casado, J. Llibre, M. Mokchah, G. Petot-Ervas, J. Calderer, Thin Solid Films 1998, 317, 241.
2. K. L. Merkle, G.-R. Bai, Z. Li, C-Y. Song, L. J. Thompson, Phys. Status Solidi A 1998, 166, 73.
3. M. H. Siadati, T. L. Ward, J. Martus, P. Atanasova, C. Xia, R. W. Schwartz, Chem. Vap. Deposition 1997, 3, 311.
4. J. Han, G. Xomeritakis, Y. S. Lin, Solid State Ionics 1997, 93, 263.
5. H. Okayama, T. Kubo, N. Mochizuki, A. Nagata, H. Isa, Shinku 1997, 40, 660.
6. K.-W. Chour, J. Chen, R. Xu, Thin Solid Films 1997, 304, 106.
7. M. Inaba, A. Mineshige, T. Maeda, S. Nakanishi, T. Ioroi, T. Takahashi, A. Tasaka, K. Kikuchi, Z. Ogumi, Solid State Ionics 1997, 104, 303.
8. J. Vetrone, C. Foster, G. Bai, Mater. Res. Soc. Symp. Proc. 1996, 403, 565.
9. G. Bertrand, M. Mévrel, Thin Solid Films 1997, 292, 241.
10. R. L. Jones, in Elevated Temperature Coatings: Science and Technology II (Eds: N. B. Dahotre, J. M. Hampikian), The Minerals, Metals and Materials Society, Warrendale PA, 1996.
11. M. Yoshuba, K. Abe, T. Aranami, Y. Harada, J. Therm. Spray Technol. 1996, 5, 259.
12. K. S. Fancey, A. Matthews, J. Vac. Sci. Technol. A 1986, 4, 2656.
13. M. Pakala, H. Walls, R. Y. Lin, J. Am. Ceram. Soc. 1997, 80, 1477.
14. W. C. Russell, C. Strandberg, Int. J. Refract. Met. Hard Mater. 1996, 14, 51.
15. T. Kubota, N. Akao, N. Hara, K. Sugimoto, J. Jpn Inst Met. 1996, 60, 980.
16. K. Tokita, F. Okada, Ferroelectrics 1998, 211, 127.
17. L-F. Tsu, G.-R. Bai, C. M. Foster, K. L. Merkle, K. C. Liu, J. Mater. Res. 1998, 13, 1614.
18. A. C. Jones, Chem. Vap. Deposition 1998, 4, 169.
19. M. Shimizu, H. Fujisawa, S. Hyodo, S. Nakashima, H. Niu, H. Okino, T. Shiosaki, J. Korean Phys. Soc. 1998, 32, S1349.
20. H. Funakubo, K. Kuroyanagi, K. Shinozaki, N. Mizutani, J. Korean Phys. Soc. 1998, 32, S1386.
21. C. H. Peng, S. B. Desu, J. Am. Ceram. Soc. 1994, 77, 1799.
22. T. Nakai, T. Tabuchi, Y. Sawado, I. Kobayashi, Y. Sugimori, Jpn. J. Appl. Phys., 1992, 31, 2992.
23. Y-K. Lee, J.-W. Park, J. Mater. Sci. Lett. 1996, 15, 1513.
24. M. Ritala, M. Leskelä, Appl. Surf. Sci. 1994, 75, 333.
25. R. Rujkorakarn, J. R. Sites, J. Vac. Sci. Technol. A 1986, 4, 568.
26. A. Kytökivi, E.-L. Lakomaa, A. Root, Langmuir 1996, 13, 4395.
27. M. Morstein, I. Pozsgai, N. D. Spencer, Proc. Electrochem. Soc. 1997, 97-25, 976.
28. H. Tomaszewski, J. Haemers, J. Denul, N. De Roo, R. De Gryse, Thin Solid Films 1996, 287, 104.
29. J. M. Philips, J. Appl. Phys. 1996, 79, 1829.
30. N. Bourhila, F. Felten, J. P. Senateur, F. Schuster, R. Madar, A. Abrutis, Proc. Electrochem. Soc. 1997, 97-25, 417.
31. N. B. Morozova, I. K. Igumenov, I. V. Yushina, B. M. Ayupov, V. I. Lisoivan, Inorg. Mater. 1993, 29, 1100.
32. N. B. Morozova, I. K. Igumenov, V. N. Mit'kin, K. V. Kradeno, O. G. Potapova, V. B. Lazarev, Ya. Kh. Grinberg, Russ. J. Inorg. Chem. 1989, 34, 672.
33. S. B. Desu, T. Shi, C. K. Kwok, Mater. Res. Soc. Symp. Proc. 1990, 168, 349.
34. M. Balog, M. Schieber, M. Michman, S. Patai, J. Electrochem. Soc. 1979, 126, 1203.
35. A. C. Jones, T. J. Leedham, P. J. Wright, M. J. Crosbie, P. A. Lane, D. J. Williams, K. A. Fleeting, D. J. Otway, P. O'Brien, Chem. Vap. Deposition 1998, 4, 46.
36. E. Frederiksson, K. Forsgren, Surf. Coat. Technol. 1996,88, 255.
37. D. C. Bradley, J. D. Swanwick, J. Chem. Soc. 1959, 748.
38. T. J. Leedham, Mater. Res. Soc. Symp. Proc. 1996, 415, 79.
39. D. C. Bradley, M. M. Faktor, J. Appl. Chem. 1959, 435.
40. G. Lu, K. L. Purvis, J. Schwartz, S. Bernasek, Langmuir 1997, 13, 5791.
41. J. B. Miller, J. Schwartz, Acta Chem. Scand. 1993, 47, 292.
42. A. C. Jones, T. J. Leedham, P. J. Wright, M. J. Crosbie, D. J. Williams, K. A. Fleeting, H. O. Davies, D. J. Otway, P. O'Brien, Chem. Vap. Deposition 1998, 4, 197.
43. -1 torr (Inorgtech Ltd., Mildenhall, UK; URL http://www.q-ten.co.uk/inorgtech/products/alkoxides.html).
44. V. G. Erkov, S. F. Devyatova, N. D. Karataeva, E. L. Molodtsova, Russ. Microelectron. 1998, 27, 174.
45. D. G. Colombo, D. C. Gilmer, V. G. Young, Jr., S. A. Campbell, W. L. Gladfelter, Chem. Vap. Deposition 1998, 4, 220.
46. M. Morstein, Inorg. Chem. 1999, 38, 125.
47. Value taken from a vapor pressure study currently being conducted in our laboratory.
48. Chemical Vapor Deposition: Principles and Applications (Eds: M. L. Hitchman, K. F. Jensen), Academic, London 1993.
49. M. Dauelsberg, L. Kadinski, C. Schmidt, C. Allenbach, M. Morstein, in Simulation of Semiconductor Processes and Devices (Proceedings of SISPAD 98) (Eds: K. De Meyer, S. Biesemans), Springer, Heidelberg 1998, p. 22.
50. M. F. Toney, in Encyclopedia of Materials Characterization (Eds: C. R. Brundle, C. A. Evans, Jr., S. Wilson), Butterworth-Heinemann, London 1992.
51. E. C. Subbarao, in Advances in Ceramics, Vol.3: Science and Technology of Zirconia (Eds: A. H. Heuer, L. W. Hobbs), American Ceramic Society, Columbus, OH 1981, p. 1.
52. D. Smith, H. Newkirk, Acta Crystallogr. 1965, 18, 983.
53. R. C. Garvie, J. Phys. Chem. 1978, 82, 218.
54. R. C. Garvie, M. F. Goss, J. Mater. Sci. 1986, 21, 1253.
55. C. R. Aita, in Processing and Fabrication of Advanced Materials V (Eds: T. R. Srivatsan, J. J. Moore), The Minerals, Metals & Materials Society, Warrendale, PA 1996, p. 459.
56. C. R. Aita, M. D. Wiggins, R. Whig, C. M. Scanlan, M. Gajdardziska-Josifovsaka, J. Appl. Phys. 1996, 79, 1176.
57. C. R. Aita, Nanostruct. Mater. 1994, 4, 257.
58. MacDiff software, current version 4.0.4 (of 22.03.99), available as freeware from the author, R. Petschik, at URL http://servermac.geologie. uni-frankfurt.de/MacDiff.html