Liquid Injection MOCVD of Zirconium Dioxide Using a Novel Mixed Ligand Zirconium Precursor

Chemical Vapor Deposition

Volumn 4, Issue 5, 1998, Pages 197-201

  Jones, Anthony C ^a   Leedham, Timothy J ^a   Wright, Peter J ^b   Crosbie, Michael J ^b   Williams, Dennis J ^b   Fleeting, Kirsty A ^c   Davies, Hywel O ^c   Otway, David J ^c   O'Brien, Paul ^c  

^a Inorgtech Limited   (United Kingdom)

^b DEFENCE SCIENCE AND TECHNOLOGY LABORATORY   (United Kingdom)

^c IMPERIAL COLLEGE LONDON   (United Kingdom)

Author keywords

MOCVD; Novel zirconium precursors; Thin films; Zirconium dioxide

Indexed keywords

EID: 0000095505     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/(sici)1521-3862(199810)04:05<197::aid-cvde197>3.3.co;2-u     Document Type: Article

References (21)

1. R. D. Veltri, F. S. Galasso, German Patent DE 3 427 911, 1986.
2. W. H. Lowdermilk, D. Milham, F. Rainer, Thin Solid Films 1980, 73, 155.
3. V. K. Khanna, R. K. Nahar, Appl. Surf. Sci. 1987, 28, 247.
4. S. B. Desu, T. Shi, C. K. Kwok, in Chemical Vapor Deposition of Refractory Metals and Ceramics (Eds: T. M. Besman, B. M. Gallois), Mater. Res. Soc. Symp. Proc. 1990, 168, 349.
5. N. M. Shorrocks, S. G. Porter, R. W. Whatmore, A. D. Parsons, J. N. Gooding, D. J. Pedder, Proc. SPIE 1990, 1320, 88.
6. J. C. Crawford, F. L. English, IEEE Trans. Electron. Devices 1969, ED-16, 525.
7. O. Auciello, R. Ramesh, in Electroceramic Thin Films, Part 1: Processing (Eds: O. Aucellio, R. Ramesh) MRS Bull. 1996, 21, 31.
8. Z. Xue, B. A. Vaartstra, K. G. Caulton, M. H. Chisholm, D. L. Jones, Eur. J. Solid State Inorg. Chem. 1992, 29, 213.
9. J. Si, S. B. Desu, C. Y. Tsai, J. Mater. Res. 1994, 9, 1721.
10. C. S. Hwang, H. J. Kim, J. Mater. Res. 1993, 8, 1361.
11. M. Pulver, G. Wahl, in Chemical Vapor Deposition, Proc. 14th Int. Conf. and EURO CVD 11 (Eds: M. D. Allendorf, C. Bernard), Electrochem. Soc. Proc. 1997, 97-25, 960.
12. D. J. Williams, unpublished.
13. D. C. Bradley, R. C. Mehrotra, D. P. Gaur, Metal Alkoxides, Academic Press, New York 1978.
14. A. C. Jones, T. J. Leedham, P. J. Wright, M. J. Crosbie, P. A. Lane, D. J. Williams, K. A. Fleeting, D. J. Otway, P. O'Brien, Chem. Vap. Deposition 1998, 4, 46.
15. A. C. Jones, T. J. Leedham, P. J. Wright, M. J. Crosbie, D. J. Williams, P. A. Lane, P. O'Brien, Mater. Res. Soc. Symp. Proc., in press (MRS Fall Mtg. 1997).
16. K. A. Fleeting, A. C. Jones, T. Leedham, M. A. Malik, P. O'Brien, D. J. Otway, Mater. Res. Soc. Symp. Proc., in press (MRS Fall Mtg. 1997).
17. K. A. Fleeting, A. C. Jones, P. O'Brien, D. J. Otway, A. J. P. White, D. Williams, Inorg. Chem., in press.
18. U. B. Saxena, A. K. Rai, V. K. Mathur, R. C. Mehrotra, D. Radford, J. Chem. Soc. A 1970, 904.
19. J. F. Roeder, B. A. Vaartstra, P. C. Van Buskirk, H. R. Beratan, Mater. Res. Soc. Symp. Proc. 1996, 415, 123.
20. R. J. Errington, J. Ridland, W. Clegg, R. A. Coxall, J. M. Sherwood, Polyhedron, 1998, 17, 659.
21. T. Won, S. Yoon, H. Kim, J. Electrochem. Soc. 1992, 139, 3284.