Epitaxial Bi4Ti3O12 thin film growth using Bi self-limiting function

Journal of Crystal Growth

Volumn 200, Issue 1-2, 1999, Pages 161-168

  Migita, S ^a   Ota, H ^a   Fujino, H ^a   Kasai, Y ^a   Sakai, S ^a  

^a ELECTROTECHNICAL LABORATORY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; BISMUTH COMPOUNDS; COMPOSITION; EVAPORATION; MOLECULAR BEAM EPITAXY; OZONE; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; THICKNESS MEASUREMENT; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

BISMUTH TITANIUM COMPOUNDS; SELF LIMITING FUNCTION;

EPITAXIAL GROWTH;

EID: 0033116338     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(98)01243-3     Document Type: Article

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