Orientation of Bi4Ti3O12-based ferroelectric thin films prepared on various kinds of substrates by metalorganic chemical vapor deposition

Journal of Crystal Growth

Volumn 235, Issue 1-4, 2002, Pages 389-393

  Watanabe, T ^a   Saito, K ^b   Funakubo, H ^a  

^a Tokyo Institute of Technology ^*  (Japan)

^b PHILIPS RESEARCH LABORATORIES   (Germany)

Author keywords

A1. Substrates; A1. X ray diffraction; A3. Metalorganic chemical vapor deposition; A3. Polycrystalline deposition; B1. Bismuth compounds; B2. Ferroelctric materials

Indexed keywords

BISMUTH COMPOUNDS; CRYSTAL ORIENTATION; METALLORGANIC CHEMICAL VAPOR DEPOSITION; POLYCRYSTALS; SUBSTRATES; X RAY DIFFRACTION ANALYSIS;

FILM ORIENTATION;

FERROELECTRIC THIN FILMS;

EID: 0036467202     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(01)01917-0     Document Type: Article

References (9)