Novel mononuclear alkoxide precursors for the MOCVD of ZrO2 and HfO2 thin films

Chemical Vapor Deposition

Volumn 8, Issue 4, 2002, Pages 163-170

  Williams, Paul A ^a   Roberts, John L ^a   Jones, Anthony C ^a   Chalker, Paul R ^a   Tobin, Neil L ^a   Bickley, Jamie F ^a   Davies, Hywel O ^b   Smith, Lesley M ^c   Leedham, Timothy J ^b  

^a UNIVERSITY OF LIVERPOOL   (United Kingdom)

^b Inorgtech Limited   (United Kingdom)

^c Epichem Ltd   (United Kingdom)

Author keywords

Alkoxide ligands; Hafnium dioxide; Liquid injection; MOCVD; Zirconium dioxide

Indexed keywords

CMOS INTEGRATED CIRCUITS; HAFNIUM COMPOUNDS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MICROELECTRONICS; THERMODYNAMICS; VAPORIZATION;

ALKOXIDE LIGANDS; LIQUID INJECTION; METAL INTERCONNECTS;

THIN FILMS;

EID: 0000876411     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-3862(20020704)8:4<163::AID-CVDE163>3.0.CO;2-V     Document Type: Article

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