Atomic-layer deposition of ZrO2 thin films using new alkoxide precursors

Materials Research Society Symposium - Proceedings

Volumn 716, Issue , 2002, Pages 145-150

  Jones, Anthony C ^a,b   Williams, Paul A ^a,b   Roberts, John L ^a   Leedham, Timothy J ^b   Davies, Hywel O ^b   Matero, Raija ^c   Ritala, Mikko ^c   Leskelä, Markku ^c  

^a UNIVERSITY OF LIVERPOOL   (United Kingdom)

^b Inorgtech Limited   (United Kingdom)

^c UNIVERSITY OF HELSINKI   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

COMPLEXATION; DEPOSITION; DIELECTRIC MATERIALS; GATES (TRANSISTOR); OXIDES; PERMITTIVITY; THIN FILMS;

ALKOXIDE PRECURSORS; ATOMIC LAYER DEPOSITION; HIGH PERMITTIVITY GATE DIELECTRIC APPLICATIONS; ZIRCONIUM DIOXIDE THIN FILMS;

ZIRCONIA;

EID: 0036945504     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-716-b3.5     Document Type: Conference Paper

References (19)

1. G.D. Wilk, R.M. Wallace and J.M. Anthony, Appl. Phys. Rev., 89, 5243 (2001).
2. M. Leskelä and M. Ritala, in Handbook of Thin Film Materials, ed. H.S. Nalwa, Academic Press, 2002, Vol. 1, p. 103.
3. M. Ritala and M. Leskelä, Appl. Surf. Sci., 75, 333 (1994).
4. K. Kukli, J. Ihanus, M. Ritala and M. Leskelä, J. Electrochem. Soc., 144, 300 (1997).
5. K. Kukli, K. Forsgren, J. Aarik, T. Uustare, A. Aidla, A. Niskanen, M. Ritala, M. Leskelä and A. Harsta, J. Cryst. Growth, 231, 262 (2001).
6. M. Copel, M. Gribelyuk and E. Gusev, Appl. Phys. Lett., 76, 436 (2000).
7. M. Putkonen and L. Niinistö, J. Mater. Chem., 11, 3141 (2001).
8. E.P. Gusev, E. Cartier, D.A. Buchanan, M. Gribelyuk, M. Copel, H. Okorn-Schmidt and C. D'Emic, Microelec. Eng., 59, 341 (2001).
9. K. Kukli, M. Ritala and M. Leskelä, Chem. Vap. Deposition, 6, 297 (2000).
10. M.A. Cameron and S.M. George, Thin Solid Films, 348, 90 (1999).
11. D.C. Bradley, Chem. Rev., 89, 1317 (1989).
12. W.A. Herrmann, N.W. Huber and O. Runte, Angew. Chem. Int. Ed. Engl., 34, 2187 (1995).
13. A.C. Jones, T.J. Leedham, P.J. Wright, M.J. Crosbie, K.A. Fleeting, D.J. Otway, P. O'Brien and N.E. Pemble, J. Mater. Chem., 8, 1773 (1998).
14. J.-H. Lee, J.-Y. Kim, J.-Y. Shin and S.-W. Rhee, J. Vac. Sci. Technol. A, 17, 3033 (1999).
15. K.A. Fleeting, P. O'Brien, A.C. Jones, D.J. Otway, A.J.P. White and D.J. Williams, J Chem. Soc., Dalton Trans., J. 2853 (1999).
16. R. Matero, M. Ritala, M. Leskelä, A.C. Jones, P.A. Williams, J.L. Roberts, N.L. Tobin, H.O. Davies and T.J. Leedham, J. Mater. Chem, to be submitted.
17. P.C. Bharara, V.D. Gupta and R.C. Mehrotra, Synth. React. Inorg. Met.-Org. Chem, 7, 537 (1977).
18. C.P. Fictorie, J.F. Evans and W.L. Gladfelter, J. J. Vac. Sci. Technol. A, 12, 1108 (1994).
19. S. Chen, M.G. Mason, H.J. Gysling, G.R. Paz-Pujalt, T.N. Blanton, T. Castro, K.M. Chen, C.P. Fictorie, W.L. Gladfelter, A. Franciosi, P.I. Cohen and J.F. Evans, J. Vac. Sci. Technol. A, 11, 2419 (1993).