Evidence of aluminum silicate formation during chemical vapor deposition of amorphous Al2O3 thin films on Si(100)

Applied Physics Letters

Volumn 75, Issue 25, 1999, Pages 4001-4003

  Klein, T M ^a   Niu, D ^a   Epling, W S ^a   Li, W ^a   Maher, D M ^a   Hobbs, C C ^b   Hegde, R I ^b   Baumvol, I J R ^c   Parsons, G N ^a  

^a North Carolina State University   (United States)

^b MOTOROLA INC   (United States)

^c FEDERAL UNIVERSITY OF RIO GRANDE DO SUL   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000081968     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.125519     Document Type: Article

References (17)

1. S. Ezhilvalavan and T. Y. Tseng, J. Mater. Sci.: Maler. Electron. 10, 9 (1999).
2. S. Zaima, T. Furuta, and Y. Yasuda, J. Electrochem. Soc. 137, 1297 (1990).
3. A. Y. Man, K. A. Son, J. M. White, D. A. Roberts, and R. N. Vrtis, J. Vac. Sci. Technol. A 17, 954 (1999).
4. K. J. Hubbard and D. G. Schlom, J. Mater. Res. 11, 2757 (1996).
5. R. Beyers, J. Appl. Phys. 56, 147 (1984).
6. F. A. Ponce, Appl. Phys. Lett. 41, 371 (1982).
7. M. Ishida, I. Katakabe, T. Nakamura, and N. Ohtake, Appl. Phys. Lett. 52, 1326 (1988).
8. H. Iizuka, K. Yokoo, and S. Ono, Appl. Phys. Lett. 61, 2978 (1992).
9. Y.-C. Kim, H.-H. Park, J. S. Chun, and W.-J. Lee, Thin Solid Films 237, 57 (1994).
10. I. Barin, Thermochemical Data of Pure Substances (VCH, New York, 1989).
11. R. G. Gordon, K. Kramer, and X. Liu, Mater. Res. Soc. Symp. Proc. 446, 383 (1997).
12. S. E. Hunt and W. M. Jones, Phys. Rev. 89, 1283 (1953).
13. I. Vickridge and G. Amsel, Nucl. Instrum. Methods Phys. Res. B 45, 6 (1990).
14. G. Battistig, G. Amsel, I. Trimaille, J.-J. Ganem, S. Rigo, F. C. Stedile, I. J. R. Baumvol, W. H. Schulte, and H. W. Becker, Nucl. Instrum. Methods Phys. Res. B 85, 326 (1993).
15. G. D. Wilk and R. M. Wallace, Appl. Phys. Lett. 74, 2854 (1999).
16. W. B. Blumenthal, The Chemical Behavior of Zirconium (D van Nostrand Co., Princeton. NJ, 1958), pp. 201-219.
17. D. C. Gilmer, D. G. Colombo, C. J. Taylor, J. Roberts, G. Haugstad, S. A. Campbell, H. S. Kim, G. D. Wilk, M. A. Gribelyuk, and W. L. Gladfelter, Chem. Vap. Deposition 4, 9 (1998).