Metalorganic chemical vapour deposition (MOCVD) of zirconia and lead zirconate titanate using a novel zirconium precursor

Journal of the European Ceramic Society

Volumn 19, Issue 6-7, 1999, Pages 1431-1434

  Jones, Anthony C ^a   Leedham, Timothy J ^a   Wright, Peter J ^b   Williams, Dennis J ^b   Crosbie, Michael J ^b   Davies, Hywel O ^c   Fleeting, Kirsty A ^c   O'Brien, Paul ^c  

^a Inorgtech Limited   (United Kingdom)

^b DEFENCE SCIENCE AND TECHNOLOGY LABORATORY   (United Kingdom)

^c IMPERIAL COLLEGE LONDON   (United Kingdom)

Author keywords

Films; MOCVD; PZT; ZrO2.

Indexed keywords

CHEMICAL BONDS; GROWTH (MATERIALS); LEAD COMPOUNDS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; OXIDES; TEMPERATURE; ZIRCONIA; ZIRCONIUM;

GROWTH RATE; LEAD ZIRCONATE TITANATE; LIQUID INJECTION METALORGANIC CHEMICAL VAPOUR DEPOSITION; NOVEL ZIRCONIUM PRECURSOR;

THIN FILMS;

EID: 0032684707     PISSN: 09552219     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0955-2219(98)00456-7     Document Type: Article

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