Low-temperature deposition of zirconium oxide-based nanocrystalline films by alternate supply of Zr[OC(CH3)3]4 and H2O

Chemical Vapor Deposition

Volumn 6, Issue 6, 2000, Pages 297-302

  Kukli, Kaupo ^a,b   Ritala, Mikko ^a   Leskelä, Markku ^a  

^a UNIVERSITY OF HELSINKI   (Finland)

^b UNIVERSITY OF TARTU   (Estonia)

Author keywords

Atomic layer deposition; Nanolaminates; Zirconium tetra tert butoxide; ZrO2

Indexed keywords

EID: 0001140789     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-3862(200011)6:6<297::AID-CVDE297>3.0.CO;2-8     Document Type: Article

References (25)

1. G. Bertrand, R. Mévrel, Thin Solid Films 1997, 292, 241.
2. K. Forsgren, A. Hårsta, J. Phys. IV 1999, 9, 487.
3. Z. Xue, B. A. Vaartstra, K. G. Caulton, M. H. Chisholm, D. L. Jones, Eur. J. Solid State Inorg. Chem. 1992, 29, 213.
4. N. Igawa, Y. Ishii, T. Nagasaki, Y. Morii, S. Funahashi, H. Ohno, J. Am. Ceram. Soc. 1993, 76, 2673.
5. Y. Takahashi, T. Kawae, M. Nasu, J. Cryst. Growth 1986, 74, 409.
6. M. A. Cameron, S. M. George, Thin Solid Films 1999, 348, 90.
7. S. Benfer, E. Knözinger, J. Mater. Chem. 1999, 9, 1203.
8. N. Bourhila, F. Felten, J. P. Senateur, F. Schuster, R. Madar, A. Abrutis, Electrochem. Soc. Proc. 1997, 97-25, 417.
9. J. Si, S. B. Desu, C.-Y. Tsai, J. Mater. Res. 1994, 9, 1721.
10. N. B. Morozova, I. K. Igumenov, I. V. Yushina, B. M. Ayupov, V. I. Lisoivan, Inorg. Mater. 1994, 29, 1100.
11. J. Shappir, A. Anis, I. Pinsky, IEEE Trans. Electron Devices 1986, ED-33, 442.
12. C. S. Hwang, H. J. Kim, J. Mater. Res. 1993, 8, 1361.
13. B. J. Gould, I. M. Povey, M. E. Pemble, W. R. Flavell, J. Mater. Chem. 1992, 4, 1815.
14. D. C. Bradley, Chem. Rev. 1989, 89, 1317.
15. T. Suntola, in Handbook of Crystal Growth 3, Thin Films and Epitaxy, Part B: Growth Mechanisms and Dynamics (Ed. D. T. J. Hurle), Elsevier, Amsterdam 1994, Ch. 14.
16. M. Ritala, M. Leskelä, Appl. Surf. Sci. 1994, 75, 333.
17. K. Kukli, J. Ihanus, M. Ritala, M. Leskelä, J. Electrochem. Soc. 1997, 144, 300.
18. A. Kytökivi, E.-L. Lakomaa, A. Root, H. Österholm, J.-P. Jacobs, H. H. Brongersma, Langmuir 1997, 13, 2717.
19. K. Kukli, M. Ritala, M. Leskelä, Nanostruct. Mater. 1997, 8, 785.
20. R. Matero, A. Rahtu, M. Ritala, M. Leskelä, T. Sajavaara, Thin Solid Films 2000, 368, 1.
21. M. Ritala, M. Leskelä, L. Niinistö, P. Haussalo, Chem. Mater. 1993, 5, 1174.
22. D. P. Thompson, A. M. Dickins, J. S. Thorp, J. Mater. Sci. 1992, 27, 2267.
23. K. Kukli, M. Ritala, M. Leskelä, J. Electrochem. Soc. 1995, 142, 1670.
24. M. Ylilammi, T. Ranta-aho, Thin Solid Films 1993, 232, 56.
25. J. Jokinen, P. Haussalo, J. Keinonen, M. Ritala, D. Riihelä, M. Leskelä, Thin Solid Films 1996, 289, 159.