Growth of bismuth titanate films by chemical vapor deposition and chemical solution deposition

Integrated Ferroelectrics

Volumn 21, Issue 1-4, 1998, Pages 331-341

  Neumayer, Deborah A ^a   Buncombe, Peter R ^a   Laibowitz, Robert B ^a   Shaw, Thomas ^a   Purtell, Robert ^a   Grill, Alfred ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

Bismuth titanate; Chemical solution deposition; Chemical vapor deposition; Ferroelectric

Indexed keywords

BISMUTH COMPOUNDS; CHEMICAL VAPOR DEPOSITION; CRYSTAL ORIENTATION; CRYSTALLIZATION; FILM GROWTH; POLARIZATION; REMANENCE; STOICHIOMETRY; THERMAL EFFECTS;

BISMUTH TITANATE; CHEMICAL SOLUTION DEPOSITION (CSD); FERROELECTRIC FILMS;

DIELECTRIC FILMS;

EID: 0032318337     PISSN: 10584587     EISSN: None     Source Type: Journal    
DOI: 10.1080/10584589808202074     Document Type: Article

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