The growth and modification of materials via ion-surface processing

Surface Science

Volumn 500, Issue 1-3, 2002, Pages 500-522

  Hanley, Luke ^a   Sinnott, Susan B ^b  

^a UNIVERSITY OF ILLINOIS AT CHICAGO   (United States)

^b UNIVERSITY OF FLORIDA   (United States)

Author keywords

Computer simulations; Growth; Ion bombardment; Ion etching; Ion implantation; Ion solid interactions; Molecular dynamics; Sputtering

Indexed keywords

COMPUTER SIMULATION; DEPOSITION; GROWTH (MATERIALS); INTERFACES (MATERIALS); IONS; KINETIC ENERGY; MOLECULAR DYNAMICS; REACTIVE ION ETCHING; SPUTTERING; THIN FILMS;

ION-SURFACE PROCESSING;

SURFACE CHEMISTRY;

EID: 0037050999     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(01)01528-X     Document Type: Article

References (151)

1. The role of ion/surface interactions and photo-induced reactions during film growth from the vapor phase
2. Inelastic processes in ion-surface collisions
3. Surface cleaning using sputtering
4. Trends in sputtering
5. Surface reactions during growth and erosion of hydrocarbon films
6. Surface mass spectrometry of molecular species
7. Surface photochemistry
8. 3/CO/Ni(1 1 1)
9. Multi-cathode unbalanced magnetron sputtering systems
10. Plasma immersion ion implantation for metallurgical and semiconductor research and development
11. Materials processing with intense pulsed ion beams
12. Directional and ionized physical vapor deposition for microelectronics applications
13. Ion beam technology for thin film applications
14. Ionized plasma vapor deposition and filtered arc deposition: Processes, properties, and applications
15. Directions in PVD coatings
16. Ion beams in silicon processing and characterization
17. A review of ion projection lithography
18. Ion projection lithography: International development program
19. Modeling of surface processes as exemplified by hydrocarbon reactions
20. Embedded-atom-method functions functions for the FCC metals Cu, Ag, Au, Ni, Pd, Pt, and their alloys
21. New empirical potential for the structural properties of silicon
22. Empirical potential for hydrocarbons for use in simulating the chemical vapor deposition of diamond films
23. Unified approach for molecular dynamics and density-functional theory
24. Order-N method for a nonorthogonal tight-binding Hamiltonian
25. Fundamental aspects of defect production in solids
26. Simulation of core excitation during cluster impacts
27. A Monte Carlo computer program for the transport of energetic ions in amorphous targets
28. Semiquantitative subplantation model for low energy ion interactions with surfaces. I. Noble gas ion-surface interactions
29. Semiquantitative subplantation model for low energy ion interactions with surfaces. II. Ion beam deposition of carbon and carbon nitride
30. Semiquantitative subplantation model for low energy ion interactions with surfaces. III: Ion beam homoepitaxy of Si
31. New routes in the preparation of mechanically hard films
32. 4
33. Carbon nitride deposited using energetic species: A two-phase system
34. Formation of C-N thin films by ion beam deposition
35. Carbon nitride deposited using energetic species: A review on XPS studies
36. Electron spectroscopic study of C-N bond formation by low-energy nitrogen ion implantation of graphite and diamond surfaces
37. Optical properties of carbon and carbon nitride films prepared by mass-separated energetic negative carbon and carbon nitrogen ions
38. Recent advances in the synthesis and properties of amorphous and crystalline carbon nitride
39. Synthesis, composition, surface roughness and mechanical properties of thin nitrogenated carbon films
40. x/ZrN superlattice coatings
41. Atomistic simulations of the vapor deposition of Ni/Cu/Ni multilayers: The effects of adatom incident energy
42. Simulations of energetic beam deposition: From picoseconds to seconds
43. Grazing-incidence metal deposition: Pattern formation and slope selection
44. + bombardment: Molecular dynamics simulations
45. The formation of vacancy-type defect clusters by ion bombardment: A problem revisited with molecular dynamics
46. Defect production in collision cascades in elemental semiconductors and fcc metals
47. Point defect movement and annealing in collision cascades
48. 6 cluster ion beams
49. Shallow junction formation by polyatomic cluster ion implantation
50. Ion cluster beam deposition of thin films
51. Thin films from energetic cluster impact: A feasibility study
52. Filling of micron-sized contact holes with copper by energetic cluster impact
53. Molecular-dynamics simulation of thin-film growth by energetic cluster impact
54. Thin films from energetic cluster impact: Experiment and molecular dynamics simulations
55. On the origin of surface smoothing by energetic cluster impact: Molecular dynamics simulation and mesoscopic modeling
56. Simple models for film growth by energetic cluster impact
57. Characterization of granular Ag films grown by low-energy cluster beam deposition
58. Molecular-dynamics investigations of cluster-beam deposition
59. Molecular-dynamics simulations of collisions between energetic clusters of atoms and metal substrates
60. Cluster-solid interactions: A molecular dynamics investigation
61. Molecular-dynamics study of collision, implantation and fragmentation of Ag7 on Pd(1 0 0)
62. Engineering surface reactions with polyatomic ions
63. Chemical modification of polystyrene surfaces by low-energy polyatomic ion beams
64. Soft-landing of polyatomic ions at fluorinated self-assembled monolayer surfaces
65. Soft landing of polyatomic ions for selective modification of fluorinated self-assembled monolayer surfaces
66. Polymeric film deposition by ionization-assisted method for optical and optoelectronic applications
67. Effects of unique ion chemistry on thin-film growth by plasma-surface interactions
68. Quantifying the effect of polyatomic ion structure on thin-film growth: Experiments and molecular dynamics simulations
69. Supercapacitors based on nanostructured carbon electrodes grown by cluster-beam deposition
70. Production of diamondlike carbon films through random compact cluster stacking
71. Collisional energy loss in cluster surface impact: Experimental, model, and simulation studies of some relevant factors
72. Growth of nanostructured carbon films by cluster assembly
73. Polymerization via cluster-solid surface impacts - Molecular dynamics simulations
74. Effect of cluster size on the reactivity of organic molecular clusters: Atomistic simulations
75. Effect of surface reactivity on the nucleation of hydrocarbon thin films through molecular-cluster beam deposition
76. Generation of 3D hydrocarbon thin films via organic molecular cluster collisions
77. Characterization of low-energy (100-10 keV) boron ion implantation
78. 2
79. + implants in (1 0 0) silicon
80. The prospects for low energy implantation with large molecular ions - The case of decaborane
81. Ultrashallow junctions in Si using decaborane? A molecular dynamics simulations study
82. Shallow junction formation by decaborane molecular ion implantation
83. Surface-science aspects of plasma-assisted etching
84. Growth mechanism of thin oxide films under low-energy oxygen-ion bombardment
85. + with oxidized Si(1 0 0)
86. Dynamics of the direct reaction of hydrogen atoms adsorbed on Cu(1 1 1) with hydrogen atoms incident from the gas phase
87. Advanced photomask reconstruction with the Seiko SIR 3000
88. Focused ion beam stimulated deposition of organic compounds
89. Ion beam modification and patterning of organosilane self-assembled monolayers
90. Focussed ion beam lithography
91. Ion-beam modification of polymeric materials - Fundamental principles and applications
92. Improved surface properties of polymer materials by multiple ion beam treatment
93. + implantation on surface properties of polymers
94. + beam treated polyimide by depth-sensing ultralow load indentation
95. Ion bombardment of polyethylene
96. Improvement in wear characteristics of steel tools by metal ion implantation
97. The search for new applications of ion implantation treatments
98. Formation of low friction and wear-resistant carbon coatings on tool steel by 75 keV, high dose carbon ion implantation
99. Implantation of titanium, chromium, yttrium, molybdenum, silver, hafnium, tantalum, tungsten, and platinum ions generated by a metal vapor deposition source into 440C stainless steel
100. Effects of implantation treatments on micromechanical properties of M2 steel
101. Industrial implementation of ion implantation on tools and wear parts based on a strategic approach
102. Changes in tribological properties of AISI 440C martensitic stainless steel after ion implantation of carbon at very high doses
103. Study of tribological properties of high-speed steel implanted by high-dose carbon ions
104. Hardness, wear and microstructure of carbon implanted AISI M2 high speed steel
105. Tribological effects of oxygen ion implantation into stainless steel
106. Changes in friction characteristics and microstructure of steel by ion implantation of titanium and additional carbon in various doses (I)
107. Changes in friction characteristics and microstructure of steel by ion implantation of titanium and additional carbon in various doses (II)
108. Time-of-flight ERDA of dual implanted metals
109. A study of dual chromium plus carbon ion implantation into high speed steel
110. Diamondlike carbon films obtained by low energy cluster beam deposition: Evidence of a memory effect of the properties of free carbon clusters
111. 60 collisions with a hydrogen-terminated diamond 1 1 1 surface
112. Hyperthermal chemistry and cluster collisions
113. 20-Si(1 1 1) surface bombardment
114. An investigation of the thermal profiles induced by energetic carbon molecules on a graphite surface
115. STM investigation of energetic carbon cluster ion penetration depth into HOPG
116. Electrospray mass spectrometry of poly(ethylene glycols) with molecular weights up to five million
117. Conformation of highly-charged gas-phase lysozyme revealed by energetic surface imprinting
118. Energetics, timescales and chemistry of low energy molecular ion-organic surface collisions
119. Focused MeV ion neams for materials analysis and microfabrication
120. Patterning a surface in the nanometric scale by ion sputtering
121. + impact onto graphite
122. Interaction of slow multicharged ions with solid surfaces
123. Surface topography development of thin polystyrene films under low energy ion irradiation
124. Focused-ion beam writing of electrical connections into platinum oxide films
125. Very high-resolution focused ion beam nanolithography improvement: A new three-dimensional pattering capability
126. Patterning curved surfaces: Template generation by ion imprint proximity lithography and relief transfer by step and flash imprint lithography
127. Combinatorial materials science and catalysis
128. Discovery of a useful thin-film dielectric using a composition-spread approach
129. Biomaterials science: An interdisciplinary endeavor
130. The effect of surface chemical modification of bioceramic on phenotype of human bone-derived cells
131. Cell adhesion on low-energy ion beam-irradiated polysiloxane surfaces
132. Nanometer-scale arrangement of human serum albumin by adsorption on defect arrays created with a finely focused ion beam
133. Molecular weight determination of plasmid DNA using electrospray ionization mass spectrometry
134. Electric field mediated deposition of bioactive polypeptides on neural prosthetic devices
135. ESI-FTICR analysis and recovery of DNA and PCR products through soft-landing
136. Soft-landing of biological compounds using a beam mass spectrometer
137. Electrospray deposition as a method for mass fabrication of mono- and multicomponent microarrays of biological and biologically active substances
138. Differentiating between capillary and counter electrode processes during electrospray ionization by opening the short circuit at the collector
139. Ion-energy effects in silicon ion-beam epitaxy
140. Ion beam deposition of Ag-107(1 1 1) films on Ni(1 0 0)
141. The role of internal energy and approach geometry in molecule/surface reactive scattering
142. Preparation of chemical gradient surfaces by hyperthermal polyatomic ion-deposition: A new method for combinatorial materials science