Soft landing of polyatomic ions for selective modification of fluorinated self-assembled monolayer surfaces

International Journal of Mass Spectrometry and Ion Processes

Volumn 174, Issue 1-3, 1998, Pages 193-217

  Luo, Hai ^a   Miller, Scott A ^a   Cooks, R Graham ^a   Pachuta, Steven J ^b  

^a PURDUE UNIVERSITY   (United States)

^b 3M COMPANY   (United States)

Author keywords

Monolayer surfaces; Polyatomic ions; Soft landing

Indexed keywords

EID: 0001540417     PISSN: 01681176     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0168-1176(97)00302-9     Document Type: Article

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