Focused MeV ion beams for materials analysis and microfabrication

MRS Bulletin

Volumn 25, Issue 2, 2000, Pages 11-13

  Breese, Mark B H ^a  

^a UNIVERSITY OF SURREY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; CRYSTAL DEFECTS; CRYSTAL LATTICES; CRYSTAL MICROSTRUCTURE; CRYSTALLOGRAPHY; ELECTRONIC PROPERTIES; GLASS; ION BEAMS; MAGNETIC FIELD EFFECTS; MICA; POLYMETHYL METHACRYLATES; SCANNING ELECTRON MICROSCOPY;

FOCUSED ION BEAM; HIGH ASPECT RATIO; ION BEAM INDUCED CHARGE MICROSCOPY; NUCLEAR MICROPROBE;

ION MICROSCOPES;

EID: 0034141102     PISSN: 08837694     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (5)

1. J.R. Tesmer and M.A. Nastasi, eds., Handbook of Modern Ion Beam Materials Analysis (Materials Research Society, Pittsburgh, 1995).
2. M.B.H. Breese, D.N. Jamieson, and P.J.C. King, Materials Analysis with a Nuclear Microprobe (John Wiley & Sons, New York, 1996).
3. F. Watt and G.W. Grime, eds., Principles and Applications of High-Energy Ion Microbeams (Adam Hilger, Bristol, UK, 1987).
4. S.A.E. Johansson, J.L. Campbell, and K.G. Malmqvist, Particle-Induced X-Ray Emission Spectrometry (PIXE) (John Wiley & Sons, New York, 1995).
5. B.L. Doyle, G. Vizkelethy, D.S. Walsh, B. Senftinger, and M. Mellon, Nucl. Instrum. Methods B 158 (1999) p. 125.