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Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 1, 1998, Pages 280-285

Characterization of low-energy (100 eV-10 keV) boron ion implantation

(4) Collart, E J H a Weemers, K a Gravesteijn, D J a Van Berkum, J G M a

a PHILIPS RESEARCH LABORATORIES (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 11644254528 PISSN: 10711023 EISSN: None Source Type: Journal
DOI: 10.1116/1.589795 Document Type: Article

Times cited : (42)

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