Comparing hyperthermal molecular and atomic ion sputtering of adsorbates: Xe+ versus SF5+ on NH3/CO/Ni(111)

International Journal of Mass Spectrometry and Ion Processes

Volumn 174, Issue 1-3, 1998, Pages 231-244

  Ada, Earl T ^a   Hanley, Luke ^a  

^a UNIVERSITY OF ILLINOIS AT CHICAGO   (United States)

Author keywords

Adsorbates; Molecular and ion sputtering; Secondary ion mass spectrometry; SF5+; SIMS; Xe+

Indexed keywords

EID: 0002244602     PISSN: 01681176     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0168-1176(97)00304-2     Document Type: Review

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