Nanometer-scale arrangement of human serum albumin by adsorption on defect arrays created with a finely focused ion beam

Langmuir

Volumn 14, Issue 24, 1998, Pages 6785-6788

  Bergman, Anna A ^a   Buijs, Jos ^a   Herbig, Jens ^b   Mathes, David T ^c   Demarest, James J ^c   Wilson, Christian D ^c   Reimann, Curt T ^b   Baragiola, Raùl A ^c   Hull, Robert ^c   Oscarsson, Sven O ^a  

^a MÄLARDALEN UNIVERSITY   (Sweden)

^b UPPSALA UNIVERSITY   (Sweden)

^c University of Virginia   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; CRYSTAL DEFECTS; ION BEAMS; MICROSCOPIC EXAMINATION; SEMICONDUCTING GALLIUM ARSENIDE; SILICA; SILICON WAFERS;

FINELY FOCUSED ION BEAM (FFIB); HUMAN SERUM ALBUMIN; TAPPING MODE SCANNING FORCE MICROSCOPY (TM-SFM);

PROTEINS;

EID: 0032203910     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la980642o     Document Type: Article

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