Ionized plasma vapor deposition and filtered arc deposition; processes, properties and applications

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 4, 1999, Pages 2351-2359

  Martin, P J ^a   Bendavid, A ^a   Takikawa, H ^b  

^a CSIRO   (Australia)

^b TOYOHASHI UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BULK PROPERTIES; FILTERED ARC; FILTERED ARC DEPOSITION; HIGH RATE; IN-VACUUM; IONIZED MATERIALS; IONIZED PLASMAS; MICRO DROPLETS; NEW APPLICATIONS; NEW MATERIAL; VACUUM ARCS;

FILMS; FLUXES; IONIZATION; MATERIALS PROPERTIES; PLASMA DEPOSITION; VACUUM; VACUUM APPLICATIONS;

DEPOSITION;

EID: 0012664816     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581772     Document Type: Conference Paper

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