메뉴 건너뛰기




Volumn 120, Issue 1-4, 1996, Pages 270-281

Plasma immersion ion implantation for metallurgical and semiconductor research and development

Author keywords

[No Author keywords available]

Indexed keywords

METALLURGY; PLASMA APPLICATIONS; PLASMA SOURCES; SEMICONDUCTOR DOPING;

EID: 0030566555     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(96)00526-5     Document Type: Article
Times cited : (28)

References (31)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.