Ultrashallow junctions in Si using decaborane? A molecular dynamics simulation study

Journal of Applied Physics

Volumn 83, Issue 6, 1998, Pages 3148-3152

  Smith, Roger ^a   Shaw, Marcus ^a   Webb, Roger P ^b   Foad, Majeed A ^c  

^a LOUGHBOROUGH UNIVERSITY   (United Kingdom)

^b UNIVERSITY OF SURREY   (United Kingdom)

^c Applied Materials   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0002684240     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.367072     Document Type: Article

References (15)

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