Very high-resolution focused ion beam nanolithography improvement: A new three-dimensional patterning capability

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 3132-3136

  Gierak, J ^a   Cambril, E ^a   Schneider, M ^a   David, C ^a   Mailly, D ^a   Flicstein, J ^b   Schmid, G ^c  

^a CNRS   (France)

^b ORANGE LABS   (France)

^c UNIVERSITY OF DUISBURG ESSEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033266681     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590967     Document Type: Article

References (16)

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