Ion projection lithography: International development program

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 3091-3097

  Kaesmaier, Rainer ^a   Löschner, Hans ^b   Stengl, Gerhard ^b   Wolfe, John C ^c   Ruchhoeft, Paul ^c  

^a INFINEON TECHNOLOGIES AG   (Germany)

^b Ionen Mikrofabrikations Syst GmbH   (Austria)

^c UNIVERSITY OF HOUSTON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0040114839     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590960     Document Type: Article

References (24)

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