Directional and ionized physical vapor deposition for microelectronics applications

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 5, 1998, Pages 2585-2608

  Rossnagel, S M ^a  

^a IBM RESEARCH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001123808     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590242     Document Type: Review

References (80)

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