Lithography for enabling advances in integrated circuits and devices

Philosophical Transactions of the Royal Society A: Mathematical, Physical and Engineering Sciences

Volumn 370, Issue 1973, 2012, Pages 4015-4041

  Garner, C Michael ^a  

^a STANFORD UNIVERSITY   (United States)

Author keywords

Circuits; Devices; Lithography; Processing

Indexed keywords

DATA PROCESSING; EXTREME ULTRAVIOLET LITHOGRAPHY; FIELD EFFECT TRANSISTORS; INTEGRATED CIRCUITS; NETWORKS (CIRCUITS); PHOTORESISTS; PROCESSING; SEMICONDUCTOR DEVICE MANUFACTURE; TECHNOLOGY; TRANSISTORS; WET ETCHING;

COMPLEMENTARY METAL OXIDE SEMICONDUCTORS; DEVICES; DIRECTED SELF-ASSEMBLY; HIGH-VOLUME PRODUCTION; IMPRINT TECHNOLOGY; INTERNATIONAL TECHNOLOGY ROADMAP FOR SEMICONDUCTORS; LOGIC TECHNOLOGY; NANOMETRES; PATTERN TRANSFERS; PHYSICAL PHENOMENA; PLASMA ETCH; PROCESS CAPABILITIES; REDUCTION TECHNOLOGIES; SEMICONDUCTOR INDUSTRY; TECHNOLOGY ROADMAPS;

LITHOGRAPHY;

EID: 84864073060     PISSN: 1364503X     EISSN: None     Source Type: Journal    
DOI: 10.1098/rsta.2011.0052     Document Type: Conference Paper

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