Negative tone 193 nm photoresists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5039 II, Issue , 2003, Pages 698-704

  Pugliano, Nick ^a   Bolton, Patrick ^a   Barbieri, Tony ^a   King, Matt ^a   Reilly, Michael ^a   Lawrence, William ^a   Kang, Doris ^a   Barclay, George ^a  

^a SHIPLEY COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DIELECTRIC MATERIALS; DISSOLUTION; ETCHING; IMAGE PROCESSING; OPTICAL PROPERTIES; SPATIAL VARIABLES CONTROL;

NEGATIVE TONE RESISTS; OPTICAL PROXIMITY EFFECT; PATTERNING NARROW TRENCHES;

PHOTORESISTS;

EID: 0141499859     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485075     Document Type: Conference Paper

References (7)

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7. Negative Photoresist for 157 nm Microlithography; A Progress Report. Conley, Will, Miller, Daniel and Zimmerman, Paul, International SEMATECH, Trinque, Brian C. and Wilson, C. Grant, Department of Chemistry and Chemical Engineering, UT Austin, Takanori, Kudo, Dammel, Ralph, Romano, Andrew, Clariant Corporation, Proc. SPIE Vol. 4690, p. 94-100, Advances in Resist Technology and Processing XIX.