Resist development to improve flare issue for EUV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6923, Issue , 2008, Pages

  Irie, Makiko ^a   Suzuki, Takako ^a   Mimura, Takeyoshi ^a   Iwai, Takeshi ^a  

^a TOKYO OHKA KOGYO CO LTD   (Japan)

Author keywords

Acid diffusion length; EUVL; Flare; Negative tone resist; Uniform film

Indexed keywords

EID: 57549115796     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.771120     Document Type: Conference Paper

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