Non-chemically amplified negative resist for EUV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7273, Issue , 2009, Pages

  Shirai, Masamitsu ^a   Maki, Koichi ^a   Okamura, Haruyuki ^a   Kaneyama, Koji ^b   Itani, Toshiro ^b  

^a Osaka Prefecture University   (Japan)

^b SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

EUV resist; Negative resist; Non CA resist; Poly(4 hydroxystyrene); Thiol ene reaction

Indexed keywords

EUV RESIST; NEGATIVE RESIST; NON-CA RESIST; POLY(4-HYDROXYSTYRENE); THIOL/ENE REACTION;

DISSOLUTION; NEGATIVE RESISTANCE; REACTION KINETICS;

ULTRAVIOLET DEVICES;

EID: 65849488700     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.813377     Document Type: Conference Paper

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