Application of 4-methyl-1-acetoxycalix[6]arene resist to complementary metal-oxide-semiconductor gate processing

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 3394-3397

  Rooks, Michael J ^a   Aviram, Ari ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033261109     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591017     Document Type: Article

References (18)

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