Development of materials and processes for negative tone development toward 32-nm node 193-nm immersion double-patterning process

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7273, Issue , 2009, Pages

  Tarutani, Shinji ^a   Hideaki, Tsubaki ^a   Kamimura, Sou ^a  

^a FUJIFILM CORPORATION   (Japan)

Author keywords

193 nm immersion lithography; CD uniformity; Defectivity; Double patterning; Fine trench imaging; Negative tone imaging

Indexed keywords

193 NM IMMERSION LITHOGRAPHY; CD UNIFORMITY; DEFECTIVITY; DOUBLE PATTERNING; FINE TRENCH IMAGING; NEGATIVE TONE IMAGING;

DATA STORAGE EQUIPMENT; DEFECT DENSITY; GEOMETRICAL OPTICS; PHOTORESISTS; SEMICONDUCTOR DOPING;

SWELLING;

EID: 65849353541     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814093     Document Type: Conference Paper

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