Development of polymers for non-CAR resists for EUV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7273, Issue , 2009, Pages

  Whittaker, Andrew K ^a   Blakey, Idriss ^a   Blinco, James ^a   Jack, Kevin S ^a   Lawrie, Kirsten ^a   Liu, Hepmg ^a   Yu, Anguang ^a   Leeson, Michael ^b   Yeuh, Wang ^b   Younkin, Todd ^b  

^a UNIVERSITY OF QUEENSLAND   (Australia)

^b INTEL CORPORATION   (United States)

Author keywords

EUV; Non CAR; Non chemically amplified resists; Polycarbonates; Polymer architecture; Polysulfones; Star block copolymers

Indexed keywords

EUV; NON-CAR; NON-CHEMICALLY AMPLIFIED RESISTS; POLYMER ARCHITECTURE; STAR BLOCK COPOLYMERS;

BIOMATERIALS; BLOCK COPOLYMERS; CARBONATES; COPOLYMERIZATION; ESTERS; PHOTONS; PHOTORESISTORS; PHOTORESISTS; POLYCARBONATES; POLYSULFONES; ULTRAVIOLET DEVICES;

POLYMERS;

EID: 65849270218     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.820493     Document Type: Conference Paper

References (9)

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