Photoresist materials: A historical perspective

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3048, Issue , 1997, Pages 28-41

  Wilison, C Grant ^a   Dammel, Ralph A ^b   Reiser, Amost ^c  

^a The University of Texas at Austin   (United States)

^b Hoechst Celanese Corporation   (United States)

^c POLYTECHNIC UNIVERSITY   (United States)

Author keywords

Bisazide; Chemical amplification; Deep UV; Diazoquinone; History; Novolac; Photoresist

Indexed keywords

HISTORY; PHENOLIC RESINS; NANOTECHNOLOGY; OPTICAL MATERIALS; PHOTOGRAPHY; SEMICONDUCTOR DEVICE MANUFACTURE;

BISAZIDE; CHEMICAL AMPLIFICATION; DEEP UV; DIAZOQUINONE; NOVOLAC;

PHOTORESISTS;

OPTICAL MICROLITHOGRAPHY;

EID: 0031353276     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.275783     Document Type: Conference Paper

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