Double-exposure materials for pitch division with 193nm lithography: Requirements, results

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7273, Issue , 2009, Pages

  Bristol, Robert ^a   Shykind, David ^a   Kim, Sungwon ^a   Borodovsky, Yan ^a   Schwartz, Evan ^c   Turner, Courtney ^c   Masson, Georgeta ^a   Min, Ke ^a   Esswein, Katherine ^a   Blackwell, James M ^a   Suetin, Nikolay ^b  

^a INTEL CORPORATION   (United States)

^b Intel Corporation   (Russian Federation)

^c NONE

Author keywords

Double exposure; LLE; Non reciprocal; rCEL; Two stage PAG

Indexed keywords

DOUBLE EXPOSURE; LLE; NON-RECIPROCAL; RCEL; TWO-STAGE PAG;

ACETONITRILE; MATERIALS TESTING; MULTIPHOTON PROCESSES; PHOTONS; PHOTORESISTORS; POLYCYCLIC AROMATIC HYDROCARBONS;

MATERIALS;

EID: 65849416098     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814352     Document Type: Conference Paper

References (8)

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