High resolution, high sensitivity inorganic resists

Microelectronic Engineering

Volumn 86, Issue 4-6, 2009, Pages 730-733

  Stowers, Jason ^a   Keszler, Douglas A ^a  

^a OREGON STATE UNIVERSITY   (United States)

Author keywords

E beam lithography; High resolution; High sensitivity; Inorganic resist; Line width roughness

Indexed keywords

E-BEAM LITHOGRAPHY; HIGH RESOLUTION; HIGH SENSITIVITY; INORGANIC RESIST; LINE WIDTH ROUGHNESS;

COMPUTER GENERATED HOLOGRAPHY; ELECTRON BEAM LITHOGRAPHY; HAFNIUM; PLASMA ETCHING; SILICON COMPOUNDS; ZIRCONIUM;

ROUGHNESS MEASUREMENT;

EID: 67349180205     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2008.11.034     Document Type: Article

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