Multi-level step and flash imprint lithography for direct patterning of dielectrics

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6151 I, Issue , 2006, Pages

  Palmieri, Frank ^a   Stewart, Michael D ^a,c   Wetzel, Jeff ^b   Hao, Jianjun ^a   Nishimura, Yukio ^a   Jen, Kane ^a   Flannery, Colm ^d   Li, Bin ^a   Chao, Huang Lin ^a   Young, Soo ^a   Kim, Woon Chun ^a   Ho, Paul S ^a   Willson, C Grant ^a  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

^b ATDF Inc   (United States)

^c MOLECULAR IMPRINTS INC   (United States)

^d NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

Dielectric; Dual damascene; ILD; Interconnect; Nanoimprint lithography; SFIL

Indexed keywords

DIELECTRIC; DUAL DAMASCENE; ILD; SFIL;

CHEMICAL MECHANICAL POLISHING; COPPER; DIELECTRIC MATERIALS; LIGHT POLARIZATION; OPTICAL INTERCONNECTS; SEMICONDUCTOR MATERIALS; SOL-GELS;

LITHOGRAPHY;

EID: 33745632075     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.655604     Document Type: Conference Paper

References (18)

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