Resist thickness effects on ultra thin HSQ patterning capabilities

Microelectronic Engineering

Volumn 86, Issue 4-6, 2009, Pages 749-751

  Sidorkin, V ^a   Grigorescu, A ^b   Salemink, H ^a   Drift, E van der ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

Contrast; Monte Carlo simulations; Resist thickness; Sensitivity; Surface roughness

Indexed keywords

CONTRAST; ELECTRON-BEAM RESISTS; HOT PLATES; HYDROGEN-SILSESQUIOXANE; IN VACUUMS; LINEWIDTH BROADENING; MONTE CARLO SIMULATIONS; RESIST THICKNESS; ROOM TEMPERATURES; SENSITIVITY; WORK FOCUS;

DEWATERING; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; HYDROGEN; METAL ANALYSIS; MONTE CARLO METHODS; OPTICAL RESOLVING POWER; SURFACE PROPERTIES; SURFACE ROUGHNESS;

SURFACE MORPHOLOGY;

EID: 67349170310     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2008.12.071     Document Type: Article

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