Optical Lithography-Thirty years and three orders of magnitude: The evolution of optical lithography tools

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3048, Issue , 1997, Pages 14-27

  Bruning, John H ^a  

^a Tropel Corporation ^*  (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BUDGET CONTROL; SCANNING; DEFECTS; INTEGRATED CIRCUITS; PRINTING; PROJECTION SYSTEMS;

CONTACT PRINTING; MIRROR SYSTEMS; PRINTING MODES; SCANNING TECHNIQUES; SHORTER WAVELENGTH; STEP-AND-REPEAT; STEP-AND-SCAN; THREE ORDERS OF MAGNITUDE;

PHOTOLITHOGRAPHY;

OPTICAL MICROLITHOGRAPHY;

EID: 0031334513     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.275782     Document Type: Conference Paper

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