SCOPUS 정보 검색 플랫폼

Volumn 63, Issue 4, 2002, Pages 391-403

Nanocomposite resist systems for next generation lithography

(9) Merhari, L a Gonsalves, K E b Hu, Y c He, W c Huang, W S d Angelopoulos, M e Bruenger, W H f Dzionk, C f Torkler, M f

a CERAMEC (France)

b UNIVERSITY OF NORTH CAROLINA AT CHARLOTTE (United States)

c UNIVERSITY OF CONNECTICUT (United States)

d IBM MICROELECTRONICS (United States)

e IBM T J WATSON RESEARCH CENTER (United States)

f FRAUNHOFER INSTITUTE FOR SILICON TECHNOLOGY ISIT (Germany)

Author keywords

Electron beam lithography; Ion projection lithography; KRS XE resist; Monte Carlo simulations; Organic inorganic nanocomposite; Proximity effects; ZEP520 resist

Indexed keywords

COMPUTER SIMULATION; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; ETCHING; IRRADIATION; MONTE CARLO METHODS; SURFACE TREATMENT;

ION PROJECTION LITHOGRAPHY;

NANOSTRUCTURED MATERIALS;

EID: 0036723017 PISSN: 01679317 EISSN: None Source Type: Journal
DOI: 10.1016/S0167-9317(02)00554-3 Document Type: Article

Times cited : (36)

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