Block copolymers and conventional lithography

Materials Today

Volumn 9, Issue 9, 2006, Pages 20-29

  Stoykovich, Mark P ^a   Nealey, Paul F ^a  

^a University of Wisconsin Madison   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTATIONAL GEOMETRY; FABRICATION; LITHOGRAPHY; MICROPROCESSOR CHIPS; PROCESS CONTROL; SUBSTRATES;

COMPLEX GEOMETRIES; CONVENTIONAL LITHOGRAPHY; IMAGING MATERIALS;

BLOCK COPOLYMERS;

EID: 33747091891     PISSN: 13697021     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1369-7021(06)71619-4     Document Type: Article

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