Improvement in linewidth roughness by postprocessing

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 26, Issue 6, 2008, Pages 2265-2270

  Chandhok, Manish ^a   Frasure, Kent ^a   Putna, E Steve ^a   Younkin, Todd R ^a   Rachmady, Willy ^a   Shah, Uday ^a   Yueh, Wang ^a  

^a INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EXTREME ULTRAVIOLETS; LINEWIDTH ROUGHNESSES; LOW ORDERS; OZONATION; POST-PROCESSING; POSTPROCESSING METHODS; SPATIAL FREQUENCIES;

LIGHT WATER REACTORS; LITHOGRAPHY; OZONE; OZONIZATION; PHOTORESISTORS; SURFACE TREATMENT;

ROUGHNESS MEASUREMENT;

EID: 57249104988     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3013860     Document Type: Article

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