Towards nanometric resolution in multilayer depth profiling: A comparative study of RBS, SIMS, XPS and GDOES

Analytical and Bioanalytical Chemistry

Volumn 396, Issue 8, 2010, Pages 2725-2740

  Escobar Galindo, Ramón ^a,b   Gago, Raul ^b   Duday, David ^c   Palacio, Carlos ^d  

^a CENTRO DE MICROANÁLISIS DE MATERIALES   (Spain)

^b INSTITUTO DE CIENCIA DE MATERIALES DE MADRID   (Spain)

^c LUXEMBOURG INSTITUTE OF SCIENCE AND TECHNOLOGY   (Luxembourg)

^d UNIVERSIDAD AUTÓNOMA DE MADRID   (Spain)

Author keywords

Depth profiling; GDOES; High resolution; Multilayer; RBS; SIMS; XPS

Indexed keywords

DECONVOLUTION; GLOW DISCHARGES; IONS; MULTILAYERS; NANOCOMPOSITES; OPTICAL EMISSION SPECTROSCOPY; RUBIDIUM; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SECONDARY ION MASS SPECTROMETRY; SPECTRUM ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

ANALYTICAL CHARACTERIZATION; CHARACTERIZATION TECHNIQUES; COMPLEX NANOSTRUCTURES; DECONVOLUTION ALGORITHM; GDOES; GLOW-DISCHARGE OPTICAL EMISSION SPECTROSCOPY; HIGH RESOLUTION; NON-DESTRUCTIVE TECHNIQUE;

DEPTH PROFILING;

EID: 77951298032     PISSN: 16182642     EISSN: 16182650     Source Type: Journal    
DOI: 10.1007/s00216-009-3339-y     Document Type: Review

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