The fate of the (reactive) primary ion: Sputtering and desorption

Applied Surface Science

Volumn 255, Issue 4, 2008, Pages 1206-1214

  Vandervorst, W ^a,b   Janssens, T ^a   Huyghebaert, C ^a   Berghmans, B ^a,b  

^a IMEC   (Belgium)

^b UNIVERSITY OF LEUVEN   (Belgium)

Author keywords

C 60; SIMS; XPS

Indexed keywords

CESIUM; DEPOSITION; DEPTH PROFILING; DESORPTION; FILM GROWTH; OXYGEN; SECONDARY ION MASS SPECTROMETRY; TURBULENT FLOW; X RAY PHOTOELECTRON SPECTROSCOPY;

BOMBARDMENT ENERGY; CLUSTER-ION BOMBARDMENTS; DESORPTION MECHANISM; DESORPTION PROCESS; HEAT OF SUBLIMATION; IONIZATION PROBABILITIES; PRECISE DETERMINATIONS; SPUTTERING PROCESS;

ION BOMBARDMENT;

EID: 56449117970     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.05.089     Document Type: Article

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