Quantitative analysis of conductive coatings by radiofrequency-powered glow discharge optical emission spectrometry: Hydrogen, d.c. bias voltage and density corrections

Surface and Interface Analysis

Volumn 33, Issue 6, 2002, Pages 472-477

  Payling, Richard ^a,b   Michler, Johann ^a   Aeberhard, Max ^a  

^a SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

^b Surface Analytical   (Australia)

Author keywords

Depth profile; Galvanized steel; GDOES; TiN

Indexed keywords

ALGORITHMS; CHEMICAL VAPOR DEPOSITION; COMPOSITION EFFECTS; DENSITY (OPTICAL); EMISSION SPECTROSCOPY; GALVANIZED METAL; GLOW DISCHARGES; HYDROGEN; NUMERICAL ANALYSIS; OPTICAL MICROSCOPY; PHYSICAL VAPOR DEPOSITION; THICKNESS MEASUREMENT;

BIAS VOLTAGE; CONDUCTIVE COATINGS; ELECTRICAL COATINGS; GLOW DISCHARGE OPTICAL EMISSION SPECTROMETRY; HARD COATINGS;

COATINGS;

EID: 0036610996     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/sia.1233     Document Type: Article

References (7)