Evaluation of the depth resolutions of Auger electron spectroscopic, X-ray photoelectron spectroscopic and time-of-flight secondary-ion mass spectrometric sputter depth profiling techniques

Thin Solid Films

Volumn 517, Issue 11, 2009, Pages 3402-3407

  Wang, J Y ^a   Starke, U ^b   Mittemeijer, E J ^a  

^a MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

^b MAX PLANCK INSTITUT FÜR FESTKÖRPERFORSCHUNG   (Germany)

Author keywords

Auger electron spectroscopy; Depth profiling; Depth resolution; Secondary ion mass spectroscopy; Si Al multilayer; Sputtering induced roughness; X ray photoelectron spectroscopy

Indexed keywords

AUGERS; DEPTH PROFILING; HIGH PERFORMANCE LIQUID CHROMATOGRAPHY; MASS SPECTROMETERS; MULTILAYERS; NEGATIVE IONS; PHOTOELECTRICITY; PHOTOELECTRONS; PHOTOIONIZATION; PHOTONS; SECONDARY EMISSION; SECONDARY ION MASS SPECTROMETRY; SELF ASSEMBLED MONOLAYERS; SPECTROMETRY; SPECTROSCOPY; SPECTRUM ANALYSIS; SURFACE ROUGHNESS; X RAY PHOTOELECTRON SPECTROSCOPY;

AES DEPTH PROFILING; ATOMIC MIXING; AUGER ELECTRONS; CONCENTRATION-DEPTH PROFILES; DEPTH RESOLUTION; FITTING PARAMETERS; INFORMATION DEPTHS; ION MASS; MEASURED DATUM; MODEL FITTINGS; MULTI-LAYERED; PREFERENTIAL SPUTTERING; SECONDARY ION MASS SPECTROSCOPY; SECONDARY IONS; SI/AL MULTILAYER; SPUTTER-DEPTH PROFILING; TIME OF FLIGHTS; TIME-OF-FLIGHT SECONDARY ION MASS SPECTROMETRIES; X-RAY PHOTOELECTRONS; XPS DEPTH PROFILING;

AUGER ELECTRON SPECTROSCOPY;

EID: 62849086728     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.01.007     Document Type: Article

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