Observation of Si emission during thermal oxidation of Si(0 0 1) with high-resolution RBS

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 249, Issue 1-2 SPEC. ISS., 2006, Pages 390-393

  Hosoi, S ^a   Nakajima, K ^a   Suzuki, M ^a   Kimura, K ^a   Shimizu, Y ^b   Fukatsu, S ^b   Itoh, K M ^b   Uematsu, M ^c   Kageshima, H ^c   Shiraishi, K ^d  

^a KYOTO UNIVERSITY   (Japan)

^b KEIO UNIVERSITY   (Japan)

^c Kashino Diverse Brain Research Laboratory of NTT Communication Science Laboratories   (Japan)

^d UNIVERSITY OF TSUKUBA   (Japan)

Author keywords

Diffusion; HRBS; Si emission; Si isotope; SiO2; Thermal oxidation

Indexed keywords

DIFFUSION; EPITAXIAL GROWTH; HETEROJUNCTIONS; ISOTOPES; PARTICULATE EMISSIONS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICA; THERMOOXIDATION;

HRBS; SI EMISSION; SI ISOTOPE;

SILICON;

EID: 33745849198     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2006.04.036     Document Type: Article

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