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Applied Surface Science

Volumn 179, Issue 1-4, 2001, Pages 307-315

Binding state information from XPS depth profiling: Capabilities and limits

(2) Oswald, S a Reiche, R a

a IFW DRESDEN (Germany)

Author keywords

Binding state identification; Depth profiling; Factor analysis; Sputtering artifacts; X ray photoelectron spectroscopy

Indexed keywords

ION BOMBARDMENT; SEMICONDUCTOR MATERIALS; SPUTTERING;

BINDING STATE IDENTIFICATION; DEPTH PROFILING; FACTOR ANALYSIS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0035898753 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/S0169-4332(01)00299-9 Document Type: Article

Times cited : (31)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.