Combination of high-resolution RBS and angle-resolved XPS: Accurate depth profiling of chemical states

Surface and Interface Analysis

Volumn 40, Issue 3-4, 2008, Pages 423-426

  Kimura, Kenji ^a   Nakajima, Kaoru ^a   Zhao, Ming ^a   Nohira, Hiroshi ^b   Hattori, Takeo ^b   Kobata, Masaaki ^c   Ikenaga, Eiji ^c   Kim, Jung Jin ^c   Kobayashi, Keisuke ^c,d   Conard, Thierry ^e   Vandervorst, Wilfried ^e  

^a KYOTO UNIVERSITY   (Japan)

^b TOKYO CITY UNIVERSITY   (Japan)

^c JASRI/Spring 8 ^*  (Japan)

^d NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^e IMEC   (Belgium)

Author keywords

Angle resolved XPS; Combination analysis; Depth profiling; High resolution RBS

Indexed keywords

HAFNIUM; PHASE COMPOSITION; PHOTOELECTRONS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL STATES; COMBINATION ANALYSIS; GATE STACK STRUCTURES;

DEPTH PROFILING;

EID: 42449116955     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.2628     Document Type: Conference Paper

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